2012 International Symposium on Extreme Ultraviolet Lithography
Tackling the roadblocks to commercialization: a complete snapshot of the state of EUV lithography
Hosted by imec in cooperation with SEMATECH and EIDEC, this year’s Symposium promises to be the most informative event, committed to addressing challenges and enabling solutions for advancing EUVL. The industry still faces a significant number of challenges for EUVL pilot line insertion in 2012/2013 and also for HVM introduction in late 2013. These challenges include progress in key critical technology issues such as:
- Mask yield and defect inspection/review infrastructure
- Long term reliable source operation for HVM
- Resist resolution, sensitivity and LER met simultaneously
Conference Chair:
Kurt Ronse (imec)
Co-Chairs:
Stefan Wurm (SEMATECH)
Ichiro Mori (EIDEC)
Geert Vandenberghe (imec)
Program Chair:
Roel Gronheid (imec)
Program Co-Chairs:
Patrick Naulleau (LBNL)
Soichi Inoue (EIDEC)
Winfried Kaiser (Carl Zeiss)
