Emerging compact extreme-ultraviolet and x-ray sources small enough to be installed in laboratories, manufacturing facilities, and hospitals will revolutionize scientific disciplines complementing large scale synchrotron radiation sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, defense and security, and industrial non-destructive testing.
This meeting is the third in a series following the 2013 Compact EUV and X-Ray Light Sources Incubator Meeting, 2014 Workshop, and 2015 Workshop. This follow-up workshop is to build upon the momentum and the enthusiasm created by the past programs by gathering both the compact light source developers, potential users, and others interested in this new field to present their work, exchange ideas, and to network with colleagues from with diverse needs and interests. The end goal is to push the technological limits, define future research directions, and build a new community of users. Visit here for more information on the program.
This workshop is again collocated with the 2016 International Symposium on Extreme Ultraviolet Lithography, and you can register for the workshop along or register for both the Symposium and OSA Workshop at a discounted rate.
To register for the OSA Compact EUV and X-Ray Light Sources Workshop Only, please click the REGISTER button at the bottom of this page.
- OSA Workshop only (up to October 4): $560 (¥ 60875.00)
- OSA Workshop only (after October 5): $680 (¥ 73920.00)
Click here to REGISTER for BOTH the OSA Compact EUV and X-Ray Light Sources Workshop and 2016 International Symposium on Extreme Ultraviolet Lithography.
- Combined Symposium & Workshop registration (Before October 4): $460 (¥ 50005.00)
- Combined Symposium & Workshop Registration (After October 5):$580 (¥ 63050.00)